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Fused Silica
Description
Fused Silica is formed by chemical combination of silicon and oxygen. Fused Silica is perfect optical material due to its
good UV and IR transmission, low coefficient of thermal expansion. It has high stability and resistance to thermal shock
over large temperature excursions, wide temperature operating range and high laser damage threshold.
 
Properties
Density 2.20g/cm3
Abbe Constant 67.6
Refractive Index (nd) at 588nm 1.4586
Wavelength
(um)
Refractive
 Index (n)
Wavelength
(um)
Refractive
Index (n)
0.2 1.55051 1 1.45042
0.22 1.52845 1.064 1.44962
0.25 1.50745 1.1 1.4492
0.3 1.48779 1.2 1.44805
0.32 1.48274 1.3 1.44692
0.36 1.47529 1.5 1.44462
0.4 1.47012 1.6 1.44342
0.45 1.46557 1.7 1.44217
0.488 1.46302 1.8 1.44087
0.5 1.46233 1.9 1.43951
0.55 1.46008 2 1.43809
0.588 1.4586 2.2 1.43501
0.6 1.45804 2.4 1.43163
0.633 1.45702 2.6 1.42789
0.65 1.45653 2.8 1.42377
0.7 1.45529 3 1.41925
0.75 1.45424 3.2 1.41427
0.8 1.45332 3.37 1.4099
0.85 1.4525 3.507 1.40566
0.9 1.45175 3.707 1.39936
 
There are different types Fused Silica according the different application. In China, there are mainly three types,
i.e. JGS1, JGS2, JGS3.Below are the application and their equivalent to other Fused Silica supplier.

Ms. Lin

Mr. Wen

Ms.Chen